Digital etching of AlGaN/GaN heterostructures with GaN cap using inductively coupled oxygen plasma process combined with wet chemical treatment
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Published:2024-10
Issue:
Volume:181
Page:108622
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ISSN:1369-8001
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Container-title:Materials Science in Semiconductor Processing
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language:en
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Short-container-title:Materials Science in Semiconductor Processing
Author:
Kim Jong-Hee,
Kim Hyeon-Cheol,
Jeong Hyeon-Yeong,
Janardhanam V.,
Kumar A. Ashok,
Rajagopal Reddy V.ORCID,
Choi Chel-Jong