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Fabrication of silicon-on-insulator with high uniform top Si for silicon photonics applications

  • Published:2020-10 Issue: Volume:117 Page:105159
  • ISSN:1369-8001
  • Container-title:Materials Science in Semiconductor Processing
  • language:en
  • Short-container-title:Materials Science in Semiconductor Processing

Author:

Gao Nan,Chen Meng,Xu Hongtao,Xue Zhongying,Zhang Nan,Fei Lu,Wei Xing

Funder

National Natural Science Foundation of China

Program of Shanghai Academic/Technology Research Leader

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference18 articles.

1. Frontiers of silicon-on-insulator;Celler;J. Appl. Phys.,2003

2. Handbook of Semiconductor Manufacturing Technology;Doering,2007

3. The past, present, and future of silicon photonics;Soref;IEEE J. Sel. Top. Quant. Electron.,2006

4. SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device;Selvaraja,2011

5. Silicon-on-insulator (Soi) Technology: Manufacture and Applications;Kononchuk,2014

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