Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Influence of substrate on the growth of microcrystalline silicon thin films deposited by plasma enhanced chemical vapor deposition

Published:2012-08 Issue:4 Volume:15 Page:412-420
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Qi Limin,Hu Zhijuan,Li Wang,Qin Xiaomei,Du Guoping,Han Weizhi,Shi Wangzhou

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference28 articles.

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