Hydrogen dilution on an undoped silicon oxide layer and Its application to amorphous silicon thin-film solar cells-Reference-Cited by-同舟云学术

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Hydrogen dilution on an undoped silicon oxide layer and Its application to amorphous silicon thin-film solar cells

Published:2016-01 Issue: Volume:41 Page:312-316
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Chen Yu-Hung,Lin Chen-Cheng,Liu Yung-Tsung,Lu Hsin-Wei,Liu Jun-Chin

Funder

Bureau of Energy, Ministry of Economic Affairs, Taiwan

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference23 articles.

1. Technological status of plasma-deposited thin-film silicon photovoltaics

2. Photovoltaic Properties of a-Si:H Films Grown by Plasma Enhanced Chemical Vapor Deposition: A Review

3. Mixed phase silicon oxide layers for thin-film silicon solar cells

4. Effect of Plasma Power on Structure of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High Frequency Plasma-Enhanced Chemical Vapor Deposition at a Low Substrate Temperature

5. Amorphous silicon oxide and its application to metal/n-i-p/ITO type a-Si solar cells

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Comprehensive Review on Thin Film Amorphous Silicon Solar Cells;Silicon;2022-01-04

2. Effect of Gas Dilution Ratios and Substrate Temperature on the Structural Transition of a-Si/μc-Si Thin-Film Solar Cell Using PECVD;Key Engineering Materials;2018-10

3. Microstructural association of diverse chemical constituents in nc-SiOx:H network synthesized by spontaneous low temperature plasma processing;Physica E: Low-dimensional Systems and Nanostructures;2018-09

4. Controlling the opto-electronic properties of nc-SiOx:H films by promotion of 〈220〉 orientation in the growth of ultra-nanocrystallites at the grain boundary;Applied Surface Science;2018-01

5. Physical stability against hydrogen plasma for ZnInSnO thin films deposited by combinatorial RF magnetron sputtering;Japanese Journal of Applied Physics;2016-11-16

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