Hydrogen depth profiling and multi-energy proton implantation: SIMS as a tool for implant process control

Author:

Samperi OrazioORCID,Vines Lasse,Bertolini Mario Pietro,Cantiano Massimiliano,Coffa Salvo,Fragalà Maria Elena

Funder

Norges Forskningsråd

Publisher

Elsevier BV

Reference15 articles.

1. Shallow donor state produced by proton bombardment of silicon;Zohta;Jpn. J. Appl. Phys.,1971

2. Carrier lifetime reduction in silicon by proton implantation through MOS structures;Mogro-Campero;J. Electrochem. Soc.,1984

3. Process development and proton implanted n-type buffer optimization for 1700V rated thin wafer fast recovery diodes;Ke,2013

4. Free-carrier absorption experiments for the investigation of the physical device properties in IGBTs with hydrogen-related donors;Korzenietz,2017

5. Applications of elastic recoil Spectrometry to hydrogen determination in solids;Tirira,1996

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