1. Effects of additives on chemical mechanical polishing of electrically induced GaN wafers;Kou;Lubr. Eng.,2020
2. Development status of semiconductor materials;Yu;Sci. Technol. Wind,2017
3. Highly efficient and damage-free polishing of GaN (0001) by electrochemical etching-enhanced CMP process;Zhang;Appl. Surf. Sci,2020
4. Current situation and trend of CMP technology for gallium nitride wafers;Xiong;Equip. Elec. Prod. Manuf,2016
5. Research on surface processing technology of GaN single wafer;Li;Semicond. Technol,2018