Lateral scaling challenges for SiGe NPN BiCMOS process integration

Author:

U’Ren Greg D.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference8 articles.

1. Rieh JS, et al. SiGe HBTs with Cut-off Frequency of 350GHz. IEDM Technical Digest. Piscataway: IEEE; 2002, p. 771–4.

2. Kempf P, Racanelli M. Silicon Germanium BiCMOS Technology. GaAs IC Technical Digest, Piscataway: IEEE; 2002, p. 3–6.

3. Racanelli M, et al. Ultra High Speed SiGe NPN for Advanced BiCMOS Technology. IEDM Technical Digest. Piscataway: IEEE; 2001 p. 336–9.

4. Si/SiGe epitaxial-base transistors. II. Process integration and analog applications

5. Jen SJ, Greenberg DR, Longsteet M, Hueckel G, Harame DL, Jadus D. Lateral Scaling of the Self-Aligned Extrinsic Base in SiGe HBTs. Proceedings of the Bipolar/BiCMOS Circuits and Technology Meeting, Minneapolis; 1996. pp. 15–8.

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