Nanocalorimetric high-temperature characterization of ultrathin films of a-Ge-Reference-Cited by-同舟云学术

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Nanocalorimetric high-temperature characterization of ultrathin films of a-Ge

Published:2006-08 Issue:4-5 Volume:9 Page:806-811
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Lopeandía A.F.,Leon-Gutierrez E.,Garcia G.,Pi F.,Bernardi A.,Goñi A.R.,Alonso M.I.,Rodríguez-Viejo J.

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference13 articles.

1. Formation of Ge nanocrystals embedded in aSiO2matrix: Transmission electron microscopy, x-ray absorption, and optical studies

2. Investigation of Ge nanocrystal formation in SiO 2 -Ge-SiO 2 sandwich structure

3. Crystallization of amorphous superlattices in the limit of ultrathin films with oxide interfaces

4. Thin film microcalorimeter for heat capacity measurements from 1.5 to 800 K

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