Radical polymerization in holographic grating formation in PQ-PMMA photopolymer part II: Consecutive exposure and dark decay-Reference-Cited by-同舟云学术

Radical polymerization in holographic grating formation in PQ-PMMA photopolymer part II: Consecutive exposure and dark decay

Published:2014-11 Issue: Volume:330 Page:199-207
ISSN:0030-4018
Container-title:Optics Communications
language:en
Short-container-title:Optics Communications

Author:

Yu Dan,Liu Hongpeng,Geng Yaohui,Wang Weibo,Zhao Yuanyuan

Funder

National Natural Science Foundation for young

Civil Aviation University of China

Funds of Tianjin Natural Science

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Polymer and Dye Probe Diffusion in Poly(methyl methacrylate) below the Glass Transition Studied by Forced Rayleigh Scattering

2. Characterization of phenanthrenequinone-doped poly(methyl methacrylate) for holographic memory

3. Phenanthrenequinone-doped poly(methyl methacrylate) photopolymer bulk for volume holographic data storage

4. Fabrication and characterization of poly(methyl methacrylate) photopolymer doped with 9,10-phenanthrenequinone (PQ) based derivatives for volume holographic data storage

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