Depth profiles of shallow implanted layers by soft ion sputtering and total-reflection X-ray fluorescence
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference13 articles.
1. Surface and Thin Film Analysis;Bubert,2002
2. Transient effects in ultra shallow depth profiling of silicon by secondary ion mass spectrometry;van der Heide;J. Chem. Phys.,2000
3. Secondary ion mass spectrometry depth profiling of ultra-shallow phosphorous in silicon;Loesing;J. Vac. Sci. Technol. B,2000
4. Depth profiling of ultra-shallow implants using a Cameca IMS-6f;Mckinley;J. Vac. Sci. Technol. B,2000
5. Fundamentals of Surface and Thin Film Analysis;Feldman,1986
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Total reflection X-ray fluorescence;Physical Sciences Reviews;2019-03-30
2. Post-implantation depth profiling using time-domain Brillouin scattering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-02
3. Performance of TXRF and GI-XRF Analyses;Total-Reflection X-Ray Fluorescence Analysis and Related Methods;2014-12-19
4. Photocatalyst TiO2–Co: the effect of doping depth profile on methylene blue degradation;Journal of Materials Science;2010-06-16
5. Applications of the ‘CATGIXRF’ computer program to the grazing incidence X-ray fluorescence and X-ray reflectivity characterization of thin films and surfaces;X-Ray Spectrometry;2010-03
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3