登录 注册 会员服务 联系我们

Automated nanoliter solution deposition for total reflection X-ray fluorescence analysis of semiconductor samples

  • Published:2006-11 Issue:10-11 Volume:61 Page:1091-1097
  • ISSN:0584-8547
  • Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
  • language:en
  • Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Sparks Chris M.,Gondran Carolyn H.,Havrilla George J.,Hastings Elizabeth P.

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference21 articles.

1. International Technology Roadmap for Semiconductors, http://public.itrs.net.

2. Application of vapor phase decomposition/total reflection X-ray fluorescence in the silicon semiconductor manufacturing environment;Buhrer;Spectrochim. Acta Part B,1999

3. Sub-ppm monitoring of transition metal contamination on silicon wafer surfaces by VPD-TXRF;Huber;Electrochem. Soc. Proc.,1988

4. Ultra-trace analysis of metallic contaminations on silicon wafer surfaces by vapour phase decomposition/total reflection X-ray fluorescence (VPD/TXRF);Neumann;Spectrochim. Acta Part B,1991

5. Saturation effects in TXRF on micro-droplet residue samples;Hellin;J. Anal. At. Spectrom.,2004
同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3