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Deposition of diamond and boron nitride films by plasma chemical vapour deposition

  • Published:1995-01 Issue:2-3 Volume:70 Page:163-174
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Albella J.M.,Gomez-Aleixandre C.,Sanchez-Garrido O.,Vazquez L.,Martinez-Duart J.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference44 articles.

1. Prospect for device implementation of wide band gap semiconductors;Edgar;J. Mater. Res.,1992

2. Low pressure diamond synthesis for electronic applications;Ravi;Mater. Sci. Eng.,1993

3. Deposition of thin diamond films;Bardos;Czech. J. Phys.,1992

4. Thin film diamond growth mechanisms;Butler;Philos. Trans. R. Soc. London, Ser. A,1993

5. Chemical vapour deposition of diamond;Angus;Philos. Trans. R. Soc. London, Ser. A,1993

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