Ion bombardment of AlN films deposited in a reactive sputtering process with accurate control of the mass flow of the reactive gas-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Ion bombardment of AlN films deposited in a reactive sputtering process with accurate control of the mass flow of the reactive gas

Published:1992-04 Issue:1-3 Volume:51 Page:500-508
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Alkjærsig K.,Christensen H.B.,Gupta B.K.,Jensen H.,Jensen U.M.,Pedersen G.N.,Sørensen G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference10 articles.

1. The dependence of aluminum nitride film crystallography on sputtering plasma composition

2. The Preparation and Properties of Aluminum Nitride Films

3. Deposition of A1N thin films by magnetron reactive sputtering

4. Stress dependence of reactively sputtered aluminum nitride thin films on sputtering parameters

5. Some properties of thin aluminium nitride films formed in a glow discharge

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Hard thin films;Anti-Abrasive Nanocoatings;2015

2. Stress, porosity measurements and corrosion behaviour of AlN films deposited on steel substrates;Thin Solid Films;2000-01

3. Structure and phase composition of low friction carbon coatings deposited on aluminium surface;Surface and Coatings Technology;1997-12

4. Materials science communication formation of aln films by al evaporation with nitrogen ion beam bombardment;Materials Chemistry and Physics;1997-11

5. XPS study of vapour deposited wear-resistant coatings implanted with nitrogen and carbon ions;Ion Beam Modification of Materials;1996

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3