Control of reactive d.c. magnetron sputtering of SnO2 by means of optical emission-Reference-Cited by-同舟云学术

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Control of reactive d.c. magnetron sputtering of SnO2 by means of optical emission

Published:1993-10 Issue:1-3 Volume:59 Page:101-104
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Kirchhoff V.,Heisig U.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference3 articles.

1. Reactive d.c. high rate sputtering as production technology;Schiller;Surf. Coat. Technol.,1987

2. Technische Dokumentation Plasma-Emissions-Monitor PEM 04,1991

3. Prozeβstabilisierung beim reactiven Hochratezerstäuben mittels optischer Emissionsspektroskopie zur industriellen Herstellung von Indium-Zinn-Oxid schichten und Titandioxidschichten;Strümpfel,1990

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1. Structural and electrical properties of Nb-doped TiO 2 films sputtered with plasma emission control;Thin Solid Films;2014-10

2. Overcoming challenges to the formation of high-quality polycrystalline TiO2:Ta transparent conducting films by magnetron sputtering;Journal of Applied Physics;2013-08-28

3. The effects of composition and pulsed biasing on chromium nitride films;Surface and Coatings Technology;2009-12

4. Process Diagnostics;Reactive Sputter Deposition;2008

5. Depth-sensitive analysis of a degraded tin oxide electrode surface in a plasma device application;Thin Solid Films;2001-12

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