Applications and trends in plasma-enhanced organometallic chemical vapour deposition-Reference-Cited by-同舟云学术

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Applications and trends in plasma-enhanced organometallic chemical vapour deposition

Published:1991-12 Issue:1-3 Volume:49 Page:233-238
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Suhr Harald

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference46 articles.

1. Textured (100) yttria‐stabilized zirconia thin films deposited by plasma‐enhanced chemical vapor deposition

2. G. Wahl, personal communication, 1990.

3. H. Suhr, unpublished results, 1991.

4. Proc. 7th Eur. Conf. on Chemical Vapour Deposition,1989

5. Proc. 7th Eur. Conf. in Chemical Vapour Deposition;Gärtner,1989

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