Production of Ti films with controlled texture-Reference-Cited by-同舟云学术

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Production of Ti films with controlled texture

Published:1995-11 Issue: Volume:76-77 Page:274-279
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Musil J.,Vlček J.,Ježek V.,Benda M.,Kolega M.,Boomsma R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference7 articles.

1. Effect of Water Vapor on the Growth of Textured ZnO-Based Films for Solar Cells by DC-Magnetron Sputtering

2. Directed sputter deposition of AlCu: Film microstructure and microchemistry

3. Growth of oriented diamond on single crystal of silicon carbide (0001)

4. Amorphous transition metal carbides

5. 4th Int. Conf. on Plasma Surface Engineering PSE-94, Garmisch-Partenkirchen, Paper FrWB6;Louro,1995

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1. Crystallographic Orientation Analysis of Nanocrystalline Tungsten Thin Film Using TEM Precession Electron Diffraction and SEM Transmission Kikuchi Diffraction;Microscopy and Microanalysis;2021-02-05

2. The structural characterizations of Ti-17 alloy films prepared by magnetron sputtering;Applied Surface Science;2018-01

3. Improving the mechanical properties of titanium films by texture strengthening;Materials Characterization;2017-05

4. The phase, morphology and surface characterization of Ti–Mo alloy films prepared by magnetron sputtering;RSC Advances;2017

5. Effects of substrate temperature on the structure, residual stress and nanohardness of Ti6Al4V films prepared by magnetron sputtering;Applied Surface Science;2016-05

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