Study and control of both target-poisoning mechanisms and reactive phenomenon in reactive planar magnetron cathodic sputtering of TiN
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference27 articles.
1. The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatings
2. A physical model for eliminating instabilities in reactive sputtering
3. Reactive sputter deposition: A quantitative analysis
4. Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
5. Reactive sputtering characteristics of silicon in an ArN2 mixture
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3. Effect of the N2/(Ar+N2) ratio on mechanical properties of high entropy nitride (Cr0.35Al0.25Nb0.12Si0.08V0.20)Nx films;Materials Chemistry and Physics;2021-12
4. Modeling current–voltage characteristics of DC reactive magnetron discharges and its application to superconducting NbTiN film deposition;Journal of Applied Physics;2021-08-28
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