Nitridation of TiSi2 thin films by rapid thermal processing-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Nitridation of TiSi2 thin films by rapid thermal processing

Published:1996-03 Issue:1-2 Volume:80 Page:72-75
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Pérez-Rigueiro J.,Jimenez C.,Vázquez L.,Pérez-Casero R.,Martínez-Duart J.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference11 articles.

1. Metallization requirements for sub-micron CMOS logic

2. Quarter-Micron Contact Hole Filling by Ionized Beam Deposition

3. Algorithms for the rapid simulation of Rutherford backscattering spectra

4. Preparation of SiTiSi2 Schottky diodes by rapid thermal annealing

5. Physics of Semiconductor Devices;Sze,1981

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nitridation enhancement of TiSi2 powders by addition of nickel;Journal of Alloys and Compounds;2017-11

2. Isothermal nitridation kinetics of TiSi2 powders;Journal of Solid State Chemistry;2014-04

3. Rapid Thermal Processing;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09

4. Characterization of the interfaces formed during the silicidation process of Ti films on Si at low and high temperatures;Surface and Interface Analysis;1997-10

5. Influence of the initial nitrogen content in titanium films on the nitridation and silicidation processes;Thin Solid Films;1997-08

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP