Nitrogen diffusion and nitride formation during and after implantation in Ni/Fe bilayers-Reference-Cited by-同舟云学术

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Nitrogen diffusion and nitride formation during and after implantation in Ni/Fe bilayers

Published:1996-09 Issue:1-3 Volume:83 Page:65-69
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Inia D.K.,Feiner F.W.J.,Arnoldbik W.M.,Vredenberg A.M.,Boerma D.O.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Formation and Growth of Compound Layer on Nitrocarburizing Iron: Kinetics and Microstructural Evolution

2. Evolution of profiles of implanted nitrogen in metal bilayers

3. Metallamide und Metallnitride, 23. Mitteilung. �ber die Bildungsw�rme des Ni?3N

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1. Electrochemical characteristics of NixN thin films deposited by DC and HiPIMS reactive magnetron sputtering;Thin Solid Films;2019-01

2. Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties;Applied Surface Science;2017-07

3. Nitriding Kinetics of Inconel 600;Surface and Coatings Technology;2013-07

4. Nonmagnetic thin layers of Ni3N;Journal of Applied Physics;2009-10

5. Effects of Ti on N distribution and diffusion in FeTiN thin films;IEEE Transactions on Magnetics;2006-01

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