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New technology for PACVD

Published:1996-08 Issue:3 Volume:82 Page:326-333
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

McKenzie D.R.,McFall W.D.,Sainty W.G.,Yin Y.,Durandet A.,Boswell R.W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference15 articles.

1. Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering

2. A simple model for the formation of compressive stress in thin films by ion bombardment

3. Deposition mechanisms for promoting sp3 bonding in diamond-like carbon

4. Time-dependent phenomena in plasma-assisted chemical vapor deposition of rugate optical films

5. Large volume, high density rf inductively coupled plasma

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Wave field structure and power coupling features of blue-core helicon plasma driven by various antenna geometries and frequencies;Chinese Physics B;2023-12-12

2. Development of a compact helicon plasma source with two sets of ring array permanent magnets for the study of blue core plasma;Review of Scientific Instruments;2023-12-01

3. Approaches for Preventing Tool Wear in Sheet Metal Forming Processes;Machines;2023-06-03

4. Development of thin film coatings with polypyrrole (ppy) by physical plasma deposition technique (PAPVD) for electrochemical capacitor;Materials for Renewable and Sustainable Energy;2023-02-21

5. APPLICATION OF PECVD IN THE CONSERVATION OF METALLIC CULTURAL HERITAGE: A REVIEW;Egyptian Journal of Archaeological and Restoration Studies;2022-12-31

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