Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition-Reference-Cited by-同舟云学术

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Adhesion improvements in silicon carbide deposited by plasma enhanced chemical vapour deposition

Published:1991-12 Issue:1-3 Volume:49 Page:462-467
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Mernagh V.A.,Kelly T.C.,Ahern M.,Kennedy A.D.,Adriaansen A.P.M.,Ramaekers P.P.J.,McDonnell L.,Koekoek R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference12 articles.

1. Intrinsic stress and mechanical properties of hydrogenated silicon carbide produced by plasma‐enhanced chemical vapor deposition

2. Silicon Nitride Films Prepared by Plasma-Enhanced Chemical Vapour Deposition (PECVD) of SiH4/NH3/N2Mixtures: Some Physical Properties

3. Adhesion testing by the scratch test method: The influence of intrinsic and extrinsic parameters on the critical load

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1. Microstructure and residual stresses of ZrN/CrN multilayer coatings formed by the plasma-assisted vacuum-arc method;Metal Working and Material Science;2022-09-15

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3. The effects of adding nano‐alumina filler on the properties of polymer‐derived SiC coating;International Journal of Applied Ceramic Technology;2021-07-17

4. Atom economy and green elimination of nitric oxide using ZrN powders;Royal Society Open Science;2018-05

5. Effect of RF power and gas flow ratio on the growth and morphology of the PECVD SiC thin film s for MEMS applications;Bulletin of Materials Science;2015-06-17

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