Principles of plasma-activated chemical vapour deposition-Reference-Cited by-同舟云学术

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Principles of plasma-activated chemical vapour deposition

Published:1987-12 Issue: Volume:33 Page:31-48
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Inspektor-Koren Aharon

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference118 articles.

1. Plasma Deposition of Inorganic Thin Films

2. Deposition Techniques for Films and Coatings;Bonnifield,1982

3. Thin Film Processes;Hollahan,1978

4. Plasma-Enhanced Chemical Vapor Deposition of Thin Films

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