Photoelectrodeposition of copper on boron-doped diamond films: application to conductive pattern formation on diamond. The photographic diamond surface phenomenon-Reference-Cited by-同舟云学术

Photoelectrodeposition of copper on boron-doped diamond films: application to conductive pattern formation on diamond. The photographic diamond surface phenomenon

Published:1999-04 Issue:16 Volume:44 Page:2711-2719
ISSN:0013-4686
Container-title:Electrochimica Acta
language:en
Short-container-title:Electrochimica Acta

Author:

Yoshihara S,Shinozaki K,Shirakashi T,Hashimoto K,Tryk D.A,Fujishima A

Publisher

Elsevier BV

Subject

Electrochemistry,General Chemical Engineering

Reference17 articles.

1. Characterization of Boron-Doped Diamond Film

2. Material and electrical characterization of polycrystalline boron‐doped diamond films grown by microwave plasma chemical vapor deposition

3. The Relationship between Resistivity and Boron Doping Concentration of Single and Polycrystalline Diamond

4. Peer Reviewed: Boron-Doped Diamond Thin-Film Electrodes

5. Photoelectrochemical properties of semiconductor diamond

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