Effect of growth pressure on sulfur content of RF-magnetron sputtered WS2 films and thermal oxidation properties of them toward using Pd decorated WO3 based H2 gas sensor-Reference-Cited by-同舟云学术

Effect of growth pressure on sulfur content of RF-magnetron sputtered WS2 films and thermal oxidation properties of them toward using Pd decorated WO3 based H2 gas sensor

Published:2023-04 Issue: Volume:381 Page:133485
ISSN:0925-4005
Container-title:Sensors and Actuators B: Chemical
language:en
Short-container-title:Sensors and Actuators B: Chemical

Author:

Mobtakeri Soheil,Habashyani Saman,Çoban Ömer,Budak Hasan Feyzi,Kasapoğlu Ahmet Emre,Gür Emre

Funder

Türkiye Bilimsel ve Teknolojik Araştırma Kurumu

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

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