Nanoimprint lithography patterned GaAs templates for site-controlled InAs quantum dots-Reference-Cited by-同舟云学术

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Nanoimprint lithography patterned GaAs templates for site-controlled InAs quantum dots

Published:2011-05 Issue:1 Volume:323 Page:183-186
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Tommila J.,Tukiainen A.,Viheriälä J.,Schramm A.,Hakkarainen T.,Aho A.,Stenberg P.,Dumitrescu M.,Guina M.

Funder

Finnish Academy

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference20 articles.

1. Site control of self-organized InAs dots on GaAs substrates by in situ electron-beam lithography and molecular-beam epitaxy

2. Imprint of sub‐25 nm vias and trenches in polymers

3. Polymer Imprint Lithography with Molecular-Scale Resolution

4. Direct imprinting using soft mold and gas pressure for large area and curved surfaces

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