Transport phenomena in radial flow MOCVD reactor with three concentric vertical inlets-Reference-Cited by-同舟云学术

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Transport phenomena in radial flow MOCVD reactor with three concentric vertical inlets

Published:2006-08 Issue:2 Volume:293 Page:498-508
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Zuo Ran,Zhang Hong,Liu Xiang-lin

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference20 articles.

1. Epitaxy-Physical Principles and Technical Implementation;Herman,2004

2. Organometallic Vapor-phase Epitaxy: Theory and Practice;Stringfellow,1989

3. Chemical Vapor Deposition,1993

4. et al;Jensen;Ann. Rev. Fluid Mech.,1991

5. Design and modeling of chemical vapor deposition reactors

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