Effect of bias voltages on the synthesis of nanostructured carbon nitride films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference16 articles.
1. Preparation and properties of nitrogen and titanium oxide incorporated diamond-like carbon films by plasma source ion implantation
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1. Low friction and wear of Nitrogen-doped diamond-like carbon films deposited on NBR with different flows of N2 by DC-MS;Vacuum;2024-02
2. Microstructure and mechanical properties of a-CN x films prepared by bias voltage assisted PLD with carbon nitride target;Surface and Coatings Technology;2014-11
3. Microstructure and mechanical properties of carbon nitride multilayer films deposited by DC magnetron sputtering;Surface and Coatings Technology;2011-01
4. Synthesis of carbon nitride powder by selective etching of TiC0.3N0.7 in chlorine-containing atmosphere at moderate temperature;Materials Chemistry and Physics;2010-09
5. NANOSTRUCTURED CARBON NITRIDE FILMS DEPOSITED USING THE LOW-COST PENNING DISCHARGE PLASMA-SPUTTERING TECHNIQUE;International Journal of Modern Physics B;2008-09-20
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