Organometallic vapor phase epitaxial growth of GaN on a 3c-SiC/Si(111) template formed by C+-ion implantation into Si(111) substrate

Author:

Yamamoto A.,Yamauchi T.,Tanikawa T.,Sasase M.,Ghosh B.K.,Hashimoto A.,Ito Y.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Cited by 22 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Mechanism of SiC formation by Si surface carbonization using CO gas;Applied Surface Science;2024-07

2. Evidence of C migration in the SiO2 to the SiO2/Si interface of C-implanted structures;Thin Solid Films;2021-07

3. Ion beam synthesis of SiC on Si toward the radiation damage free limit;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2019-04

4. Influence of treatment in weak magnetic fields on photoluminescence of GaN:Si;Semiconductor physics, quantum electronics and optoelectronics;2015-03-25

5. Optoelectronic properties of improved GaN semiconductor on Si (111) using growth approaches and different interlayer's;World Journal of Engineering;2013-10-01

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