Formation of dendritic crystal structures in thin silicon films on silicon dioxide by carbon ion implantation and high intensity large area flash lamp irradiation-Reference-Cited by-同舟云学术

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Formation of dendritic crystal structures in thin silicon films on silicon dioxide by carbon ion implantation and high intensity large area flash lamp irradiation

Published:2014-02 Issue: Volume:388 Page:70-75
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Voelskow M.,Endler R.,Schumann T.,Mücklich A.,Ou X.,Liepack E.H.,Gebel T.,Peeva A.,Skorupa W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference18 articles.

1. Frontiers of silicon-on-insulator

2. J. Dore, R. Evans, B.D. Eggleston, S. Varlamov, and M.A. Green, MRS Proceedings, 2012, 10.1557/opl.2012.866.

3. Crystallization of Deposited Amorphous Silicon by Infrared Laser Irradiation

4. Sputtered amorphous silicon thin films for diode laser crystallization

5. Flash-Lamp-Induced Lateral Solidification of Thin Si Films

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1. Modification in electrical conductivity correlated with surface, structural & optical characteristics of graphite ions implanted CR-39;Heliyon;2024-07

2. The generation, detection and measurement of laser-induced carbon plasma ions and their implantation effects on brass substrate;Radiation Effects and Defects in Solids;2016-05-03

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