Robust Si wafer

Author:

Huang Xinming,Sato Tsuyoshi.,Nakanishi Masami,Taishi Toshinori,Hoshikawa Keigo,Uda Satoshi

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference25 articles.

1. Diffusion-Induced Stress and Lattice Disorders in Silicon

2. Process‐Introduced Structural Defects and Junction Characteristics in N P N Silicon Epitaxial Planar Transistors

3. M. Obry, W. Bergholz, H. Cerva, W. Kuerner, M. Schrems, J.U. Sachse R. Winkler, in: T. Abe, W.M. Bullis, S. Kobayashi, W. Lin, P. Wagner (Eds.), Defects in Silicon III, vol. 99-1, Electrochemical Society, Seattle, Washington, 1999 p. 133.

4. Slip-Free Rapid Thermal Processing in Single Wafer Furnace

5. Design of Single-Wafer Furnace and Its Rapid Thermal Processing Applications

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