Growth of ZnO :Al by high-throughput CVD at atmospheric pressure-Reference-Cited by-同舟云学术

Growth of ZnO :Al by high-throughput CVD at atmospheric pressure

Published:2012-05 Issue:1 Volume:347 Page:56-61
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Illiberi A.,Simons P.J.P.M.,Kniknie B.,van Deelen J.,Theelen M.,Zeman M.,Tijssen M.,Zijlmans W.,Steijvers H.L.A.H.,Habets D.,Janssen A.C.,Beckers E.H.A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference33 articles.

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4. Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings

5. Novel approach to thin film polycrystalline silicon on glass

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