Crystallographic properties of grain size-controlled polycrystalline silicon thin films deposited on alumina substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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1. Polycrystalline Silicon Films on SiO2 Substrate Treated by Excimer Laser Annealing;Advanced Materials Research;2013-08
2. Epitaxial Growth of Silicon Films on SiO$_{2}$ Patterned Si(100) Substrates by Atmospheric Pressure Chemical Vapor Deposition;Japanese Journal of Applied Physics;2012-09-20
3. Epitaxial Growth of Silicon Films on SiO2Patterned Si(100) Substrates by Atmospheric Pressure Chemical Vapor Deposition;Japanese Journal of Applied Physics;2012-09-01
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