A computational investigation on the mechanism of the reaction between O(1D) and NF3-Reference-Cited by-同舟云学术

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A computational investigation on the mechanism of the reaction between O(1D) and NF3

Published:2002-12 Issue:5-6 Volume:366 Page:676-682
ISSN:0009-2614
Container-title:Chemical Physics Letters
language:en
Short-container-title:Chemical Physics Letters

Author:

Antoniotti Paola,Grandinetti Felice

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Reference35 articles.

1. Electrical impedance analysis and etch rate maximization in NF3/Ar discharges

2. Gas utilization in remote plasma cleaning and stripping applications

3. Advanced Inorganic Fluorides;Ishii,2000

4. Advanced Inorganic Fluorides;Meshri,2000

5. http://www.fabtech.org/industry.news/9910/22.07.shtml

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Experimental and Computational Study of the Gas-Phase Reaction of O(1D) Atoms with VF5;The Journal of Physical Chemistry A;2013-01-29

2. Thermal Rate Constant Calculation of the NF + F Reactive System Multiple Arrangements;The Journal of Physical Chemistry A;2011-07-06

3. Removal of the potent greenhouse gas NF3 by reactions with the atmospheric oxidants O(1D), OH and O3;Physical Chemistry Chemical Physics;2011

4. A theoretical study of the interactions of NF3with neutral ambidentate electron donor and acceptor molecules;Phys. Chem. Chem. Phys.;2011

5. A Computational Investigation of the Multiple Channels of the NF2 + F Reaction;The Journal of Physical Chemistry A;2009-11-04

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