Ion chemistry in octafluorocyclobutane, c-C4F8
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
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3. Modeling of C4F8 inductively coupled plasmas: effects of high RF power on the plasma electrical properties;Plasma Sources Science and Technology;2019-08-08
4. Electron induced ionization of plasma processing gases: C4Fx(x = 1–8) and the isomers of C4F6and C4F8;Journal of Physics D: Applied Physics;2018-03-22
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