Ab initio calculations of the electronic states of acetyl radical
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference27 articles.
1. J.G. Calvert, J.N. Pitts, Jr., Photochemistry, Wiley, New York, 1996.
2. Evidence for stepwise dissociation dynamics in acetone at 248 and 193 nm
3. Photofragmentation dynamics of acetone of 193 nm: State distributions of the CH3and CO fragments by time‐ and wavelength‐resolved infrared emission
4. Laser photolysis, infrared fluorescence determination of methyl(.nu.3) vibrational deactivation by helium, argon, nitrogen, carbon monoxide, sulfur hexafluoride, and acetone
5. Photofragmentation of acetone at 193 nm: rotational- and vibrational-state distributions of the carbon monoxide fragment by time-resolved FTIR emission spectroscopy
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