Deposition of large area uniform diamond films by microwave plasma CVD-Reference-Cited by-同舟云学术

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Deposition of large area uniform diamond films by microwave plasma CVD

Published:2018-01 Issue: Volume:147 Page:134-142
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Weng J.,Liu F.,Xiong L.W.,Wang J.H.,Sun Q.

Funder

Natural Science Foundation of China

the Science and Technology Research Program of Hubei Education Department

the Research Fund of Wuhan Institute of Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference39 articles.

1. Investigations on etching resistance of undoped and boron doped polycrystalline diamond films by oxygen plasma etching;Liu;Vacuum,2016

2. Nanocrystalline diamond films growth by microwave ECR CVD: studies of structural and photoconduction properties;Kumar;Vacuum,2016

3. Surface structure and electric properties of nitrogen incorporated NCD films;Sun;Vacuum,2017

4. Synthesizing diamond film on Cu, Fe and Si substrate by in-liquid microwave plasma CVD;Gautama;Precis. Eng.,2017

5. Fundamentals towards large area synthesis of multifunctional Ultrananocrystalline diamond films via large area hot filament chemical vapor deposition bias enhanced nucleation/bias enhanced growth for fabrication of broad range of multifunctional devices;Alcantar-Peña;Diam. Relat. Mater.,2017

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3. The 4-inch free-standing diamond film prepared by MPCVD at 10kW;Functional Diamond;2024-05-22

4. Microwave plasma CVD of diamond films on high concentration alloys: Microstructure, hardness and wear properties;Vacuum;2024-04

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