Structure and properties of Al2O3 thin films deposited by ALD process
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference26 articles.
1. Chemical and electrochemical characterization of hybrid PVD + ALD hard coatings on tool steel;Marin;Electrochem. Commun.,2009
2. Structure, chemical and phase compositions of coatings deposited by reactive magnetron sputtering onto brass substrate;Lukaszkowicz;J. Mater. Process. Technol.,2004
3. Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating;Park;Surf. Coat. Technol.,2014
4. Atomic layer deposition of ZnO: a review;Tynell;Semicond. Sci. Technol.,2014
5. A brief review of atomic layer deposition: from fundamentals to applications;Johnson;Mater. Today,2014
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