Formation of SiO2 surface textures via CHF3/Ar plasma etching process of poly methyl methacrylate self-formed masks-Reference-Cited by-同舟云学术

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Formation of SiO2 surface textures via CHF3/Ar plasma etching process of poly methyl methacrylate self-formed masks

Published:2014-03 Issue: Volume:101 Page:67-70
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Rad Maryam Alsadat,Ibrahim Kamarulazizi,Mohamed Khairudin

Funder

Universiti Sains Malaysia

Malaysian Minister of Higher Education

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference22 articles.

1. Fabrication of nano-porous silicon oxide layers by plasma polymerisation methods;Chifen;Materials Letters,2007

2. Black silicon layer formation for application in solar cells;Yoo;Solar Energy Materials and Solar Cells,2006

3. Black germanium produced by inductively coupled plasma etching;Schicho;Materials Letters,2013

4. Nanograss and nanostructure formation on silicon using a modified deep reactive ion etching;Mehran;Applied Physics Letters,2010

5. Three-dimensional nanopillar-array photovoltaics on low-cost and flexible substrates;Fan;Nature Materials,2009

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