Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer-Reference-Cited by-同舟云学术

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Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer

Published:2014-11 Issue: Volume:109 Page:166-169
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Thungsuk Nuttee,Nuchuay Peerapong,Hirotani Daisuke,Okamura Yoshimi,Nakabayashi Kenichi,Kinoshita Hiroyuki,Yuji Toshifumi,Mungkung Narong,Kasayapanand Nat

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference24 articles.

1. The future of organic photovoltaic solar cells as a direct power source for consumer electronics

2. A top-down analysis: Determining photovoltaics R&D investments from patent analysis and R&D headcount

3. A review on global renewable electricity scenario

4. Development of interdigitated solar cell and module processes for polycrystalline-silicon thin films

5. Monolithically integrated flexible Cu(In,Ga)Se2 solar cells and submodules using newly developed structure metal foil substrate with a dielectric layer

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface chemical structure of poly(ethylene naphthalate) films during degradation in low-pressure high-frequency plasma treatments;Japanese Journal of Applied Physics;2018-05-29

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