Near-surface sensitive infrared reflection spectroscopy on SiO2 implanted with high-flux negative ions
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference16 articles.
1. Negative-ion implantation technique
2. Further evaluation of the high intensity plasma sputter heavy negative ion source
3. Kishimoto N, Takeda Y, Gritsyna VT, Iwamoto E, Saito T. In: Matsuo J, Takaoka G, Yamada I, editors. IEEE Transactions from 1998 International Conference on Ion Implantation Technology Proceedings, New York:IEEE;1999. p. 342.
4. In-beam growth and rearrangement of nanoparticles in insulators induced by high-current negative copper ions
5. Microstructural changes in silicon thermal oxide induced by high-flux copper negative-ion implantation
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