Measurement of total energy flux density at a substrate during TiOx thin film deposition by using a plasma jet system
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference19 articles.
1. Thin film processes;Thornton,1987
2. Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films
3. Investigation of the RF pulse modulated plasma jet system during the deposition of Pb(ZrxTi1−x)O3 thin films on polymer substrates
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review;Journal of Physics D: Applied Physics;2014-05-14
2. Effect of Series Capacitance and Accumulated Charge on a Substrate in a Deposition Process with an Atmospheric-Pressure Plasma Jet;Japanese Journal of Applied Physics;2010-06-21
3. Double hollow cathode plasma jet-low temperature method for the TiO2−xNx photoresponding films;Electrochimica Acta;2010-02
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