The effect of target material concentration on EUV near 6.7 nm and out-of-band radiation of laser-produced Gd plasma

Author:

Zhang Yibin,Dou YinpingORCID,Xie Zhuo,Zhang Qijin,Wen Zhilin,Wang Chaohui,Yin Weihao,Song Xiaowei,Gao Xun,Lin Jingquan

Publisher

Elsevier BV

Reference29 articles.

1. Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation;Wang;Front. Optoelectron.,2021

2. Demonstration of multi-pass amplification of 46.9 nm laser pumped by capillary discharge;Zhao;Matter Radiat. Extremes,2023

3. The development of laser-produced plasma EUV light source

4. EUV source system development update: advancing along the path to HVM;Myers;SPIEL,2005

5. Laser-produced terbium and gadolinium plasmas as EUVL source at 6.5 ∼ 6.7 mm[C];Dunne,2010

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