Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Low-temperature growth at 225 °C and characterization of carbon nanowalls synthesized by radical injection plasma-enhanced chemical vapor deposition

Published:2024-06 Issue: Volume:224 Page:113180
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Minh Ngo Quang^ORCID,Van Nong Ngo^ORCID,Oda Osamu,Ishikawa Kenji,Hori Masaru

Publisher

Elsevier BV

Reference35 articles.

1. Antimicrobial photoinactivation approach based on natural agents for control of bacteria biofilms in spacecraft;Buchovec;Int. J. Mol. Sci.,2020

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3. Lightweight and flexible graphene foam composites for high-performance electromagnetic interference shielding;Chen;Adv. Mater.,2013

4. From protosolar space to space exploration: the role of graphene in space technology and economy;Scalia;Nanomaterials,2023

5. Developing polymer composite materials: carbon nanotubes or graphene?;Sun;Adv. Mater.,2013

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of Plasma Ions/Radicals on Kinetic Interactions in Nanowall Deposition: A Review;Advanced Engineering Materials;2024-07-10

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