Ionization of copper in gas and gasless modes of continuous high-power magnetron sputtering
Author:
Funder
Russian Science Foundation
Publisher
Elsevier BV
Reference20 articles.
1. High power impulse magnetron sputtering discharge;Gudmundsson;J. Vac. Sci. Technol. A.,2012
2. Mass and energy resolved detection of ions and neutral sputtered species incident at the substrate during reactive magnetron sputtering of Ti in mixed Ar+N2 mixtures;Petrov;J. Vac. Sci. Technol. A.,1994
3. Low pressure magnetron sputtering using ionized, sputtered species;Posadowski;Surf. Coat. Technol.,1991
4. Sustained self‐sputtering using a direct current magnetron source;Posadowski;J. Vac. Sci. Technol. A.,1993
5. Ar incorporation in epitaxial TiN films deposited by reactive magnetron sputtering in mixed Ar/N2 discharges;Hultman;Appl. Phys. Lett.,1988
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