Xenon plasma as a potential source for EUV and soft X-ray radiations: Numerical experiments
Author:
Funder
University of Malaya
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference36 articles.
1. Plasma sources for EUV lithography exposure tools
2. RIKEN Review No. 5;Stamm,2003
3. A novel fast capillary discharge system emitting intense EUV radiation
4. Study of a fast ablative capillary discharge dedicated to soft x-ray production
5. Vacuum spark point source for x-ray/EUV lithography
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