Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference36 articles.
1. A novel pulsed magnetron sputter technique utilizing very high target power densities
2. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
3. A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
4. High power impulse magnetron sputtering and related discharges: Scalable plasma sources for plasma-based ion implantation and deposition
5. Discharge physics of high power impulse magnetron sputtering
Cited by 54 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effects of pulse time offset between Cr and Zr dual cathodes in closed-magnetic-field unipolar high-power impulse magnetron sputtering;Surface and Coatings Technology;2024-08
2. Structure and mechanical properties of TiAlTaN thin films deposited by dcMS, HiPIMS, and hybrid dcMS/HiPIMS;Surface and Coatings Technology;2024-07
3. High-power-density sputtering of industrial-scale targets: Case study of (Al,Cr)N;Materials & Design;2024-01
4. Oxidation properties of quaternary Zr-based diboride thin films grown by hybrid high-power impulse/DC magnetron co-sputtering;Journal of Vacuum Science & Technology A;2023-12-04
5. Industrial application potential of high power impulse magnetron sputtering for wear and corrosion protection coatings;Journal of Applied Physics;2023-10-23
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3