On the fundamental mechanisms of active screen plasma nitriding
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference22 articles.
1. Role of nitrogen atoms in “ion-nitriding”;Tibbets;J Appl Phys,1974
2. Study of ion-nitriding;Hudis;J Appl Phys,1973
3. A study of the mechanisms of ion nitriding by the application of a magnetic field;Brokman;J Appl Phys,1981
4. Low-pressure, high-density plasma nitriding: mechanisms, technology and results;Czerwiec;Surf Coat Technol,1998
5. On the mechanisms of diode plasma nitriding in N2–H2 mixtures under DC-pulsed substrate biasing;Walkowicz;Surf Coat Technol,2003
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