High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
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3. Enhancement of the ion flux to the substrate through high-voltage biasing in an electron cyclotron resonance plasma and its application to high-speed deposition of conductive carbon film;Japanese Journal of Applied Physics;2021-12-01
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