High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization
Author:
Funder
Japan Ministry of Education, Culture, Sports, Science and Technology
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference32 articles.
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4. Observation of radio frequency ring-shaped hollow cathode discharge plasma with MgO and Al electrodes for plasma processing;Ohtsu;J. Vac. Sci. Technol. A,2014
5. Development of high-density radio frequency plasma source with a ring-shaped trench hollow electrode for dry processing;Ohtsu;Plasma Sources Sci. Technol.,2010
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2. Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma;Journal of Vacuum Science & Technology A;2022-09
3. Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source;AIP Advances;2022-01-01
4. Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization;Vacuum;2020-11
5. Development of rotational maze-shaped RF magnetron plasma for successful target utilization and thin-film preparation;Japanese Journal of Applied Physics;2020-10-16
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