Application of high-density plasma to sputtering and reactive sputtering processes
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference5 articles.
1. High-density flat plasma production based on surface waves
2. UHV-Compatible Apparatus for the High-Density Plasma Induced by Surface Wave Modes
3. Plasma diagnostic techniques;Chen,1965
4. The stopping power and ranges of ions in solids;Ziegler,1985
5. Modeling of reactive sputtering of compound materials
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1. The Effect of Ion Current Density on Target Etching in Radio Frequency-Magnetron Sputtering Process;Plasma Science and Technology;2012-03
2. Investigations of the electron-induced ablation in the surface wave plasma;Vacuum;2010-06
3. Study of ion beam sputtering using a glow discharge ion source;Brazilian Journal of Physics;2010-03
4. Growth and characterization of AuN films through the pulsed arc technique;Materials Characterization;2008-02
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